Article Index



Sunday, September 17, 2017


17:00 – 19:30

Opening reception and poster session

Monday, September 18, 2017


9:00 – 9:15

Opening remarks


9:15 – 9:50

Keynote Presentation:

DSA patterning options for logic and memory applications

Charlie Liu, IBM

Session 1: Design 1



9:50 – 10:10


Silicon Nanowires Patterning using UV-assisted Graphoepitaxy Approach for Precise Control of Template Affinity


Maxime Argoud, CEA-Leti


10:10 – 10:30


Directed Self-Assembly of Block Copolymer Films on Atomically-Thin Graphene Chemical Patterns


Shisheng Xiong, U. Chicago


10:30 - 10:50


Directed Self-Assembly integration Scheme for the Fabriaction of Suspended Nanowires


Marta Fernandez-Regulez, IMB-CNM


10:50 – 11:20





Session 2: Processing 1



11:20 – 11:40

Directed Self-Assembly of Block Copolymers via Photothermal Affect


Hyeong Min Jin, Kaist


11:40 – 12:00

Entropy Dependence of Ordering Kinetic and Segregation Thermodynamic in 2D Hexagonal Pattern of Cylinder-Forming PS-b-PMMA Block Copolymer


Gabriele Seguini, Laboratorio MDM


12:00 – 12:20


Relaxing Anneal Requirements for Block Copolymer (BCP) Process Optimization



Mary Ann Hockey, Brewer Science

Lunch/ Poster session /Invited presentation



12:20 – 13:20





13:20 – 14:40


Poster session



14:40 – 15:10


Invited paper:

Self-Assembled PS-b-PMMA Block Copolymers: A Valuable Platform for Application Driven Investigations



Michele Perego, Laboratorio MDM

Session 3: Simulation



15:10 – 15:30


Ising-Model-Based Computation by Using Block Copolymer Self-Assembly


Hyung Wan Do, MIT


15:30 – 15:50


Defect Reduction of Chemi-epitaxy DSA Pattern


Makoto Muramatsu, TEL


15:50 – 16:10


Analyzing the Mechanisms of Cylinder fFrmation and Defect Annihilation in Single-Hole Confinements using the Zero-Temperature String Method


Cody Bezik, U. Chicago


16:10 – 16:40





Session 4: Processing 2



16:40 – 17:00


Implementation of Directed Self-Assembly of Block Copolymers in Manufacturing: Opportunities and Challenges


Paulina Rincon-Delgadillo, IMEC


17:00 – 17:20


Defect Dynamics in Self-Assembling Processes of Block Copolymers


Azuma Tsukasa, Eidic



19:00 – 22:30


Conference Dinner



Tuesday, September 19, 2017



9:00 – 9:35


Keynote presentation:

Directed Self Assembly Technology and Applications


Seiji Morita, Toshiba


Session 5: Materials



9:35 – 9:55


Design of Block Copolymers for Sub-10nm Lithography


Natsuko Ito, University of Texas


 9:55 – 10:15


Templated Self-assembly of PS-branch-PDMS Janus Bottle Brush Copolymer


Li-Chen Cheng, MIT


10:15 – 10:35


Materials Meeting Electronic Requirements for Sub-10 nm Lithograph


Christophe Navarro, Arkema


10:35 – 10:55


Metal Reduction on High X Block Copolymer by Filtration


Toru Umeda, Nihon Pall


10:55 – 11:20





Session 6: Design 2



11:20 – 11:40


Inorganic Guiding Template Implementation for DSA Contact Hole Shrink Process


Ahmed Gharbi, CEA-Leti


11:40 – 12:00


Orientation Control of Block Copolymers for DSA Applications


Kristin Schmidt, IBM


12:00 – 12:20


Self-Asligned Cut Masks for Directed Self-Assembly of Device Relevant Features



Moshe Dolejsi, Univ of Chicago

Lunch/ Invited Presentation



12:20 – 13:20





13:20 – 13:50


Invited presentation:

BCP self-assembly and DSA process characterization with 3D CDSEM



Shimon Levi, AMAT

Session 7: Metrology



13:50 – 14:10


DSA Metrology using molecular simulation and SAXS


Alec Bowen, Univ of Chicago


14:10 – 14:30


In situ investigation of Al2O3 growth via sequential infiltration synthesis in self-assembled block copolymer templates



Danielle Nazarri, Laboratorio MDM



14:30 – 14:50


Characterization of the Internal Structure of BCP Filled Contact Holes with Critical Dimension Small Angle X-ray Scattering


Daniel Sunday, NIST


14:50 – 15:20


3D Metrology for Graphoepitaxy DSA Hole Shrink Process


Chun Zhou, University of Chicago


Discussion, Voting and adjourn



15:20 – 16:20


Debate and Voting




16:20 – 16:40


Closing Remarks








Poster session





CD-SEM Metrology investigation for DSA high-resolution line and space patterning



Ahmed Gharbi, CEA-Leti.


Directed Self-Assembly by chemo-epitaxy approach for sub-10nm line/space patterning


Maxime Argoud, CEA-Leti


Effect of Block Copolymer structural asymmetry on directed self-assembly from simulation


Benjamin Nation, Georgia Institute of Technology


Xylan Block Copolymer for Wide-Range Directed Self-Assembly Lithography and Sequential Infiltration Synthesis


Kazuyo Morita, Oji Holdings Corporation


Influence of Casting-solvent on the self-assembly of sub-10nm PS-b-PDMS


Tommaso J. Giammaria, Laboratorio MDM


Synthesis and self-assembly of poly(4-tertbutylstyrene)-block-poly(2-hydroxyethyl methacrylate)


Caleb Breaux, Georgia Institute of Technology


Effect of Film Thickness and Mixed Solvent Vapor Ratio on Thin-Film Morphologies of ABA Triblock Copolymers under Solvent Vapor Annealing


Sangho Lee, MIT


3D Complicated Multimetal Nanomesh Patterns Fabricated from Perforacted Lamellar Block Copolymer Self-Assembly


Seung Keun Cha, KAIST


Low defect density hexagonal array patterning with the CHIPS flow


Arjun Singh, IMEC


Process optimization and variability improvement of contact holes using grapho-epitaxy DSA


Caroline Boeckx, IMEC


Tuning Localized Surface Plasmon Resonances by self-assembly in Multi-Metal Nanostructures


Hanna Hulkonen, Tampere University of Technology


Effect of Xylan on Block Copolymer for Directed Self-Assembly Lithography  


Kazuyo Morita, Oji Holdings Corporation


Formation of 3D DSA Structure Using Liquid Crystalline Block Copolymer Linked by Metal Complex


Miki Fukuya, Sumitumo Bakelite Corporation


Efficient Modeling of DSA using advanced computation methods


Benjamin Nation, Georgia Institute of Technology


DSA Process Window Expansion by Oxygen Concentration


Yuji Tanak, Screen


Phase Separation Performance of topcoat free Si-containing High X Block Copolymers


Yukio Kawaguchi, HORIBA STEC


Directed Self Assembly of liquid crystalline blue-phases into ideal single crystals


Xiao Li, University of Chicago


Structural Interrogation of thin polymer films using soft X-rays


Daniel Sunday, NIST


Directed Self-Assembly of Colloidal particles onto nematic liquid crystalline defects engineered by chemically patterned surfaces


Xiao Li, University of Chicago