Agenda

Sunday, September 17, 2017

 

17:00 – 19:30

Opening reception and poster session

Monday, September 18, 2017

 

9:00 – 9:15

Opening remarks

 

9:15 – 9:50

Keynote Presentation:

DSA patterning options for logic and memory applications

Charlie Liu, IBM

Session 1: Design 1

 

 

9:50 – 10:10

 

Silicon Nanowires Patterning using UV-assisted Graphoepitaxy Approach for Precise Control of Template Affinity

 

Maxime Argoud, CEA-Leti

 

10:10 – 10:30

 

Directed Self-Assembly of Block Copolymer Films on Atomically-Thin Graphene Chemical Patterns

 

Shisheng Xiong, U. Chicago

 

10:30 - 10:50

 

Directed Self-Assembly integration Scheme for the Fabriaction of Suspended Nanowires

 

Marta Fernandez-Regulez, IMB-CNM

 

10:50 – 11:20

 

Break

 

 

Session 2: Processing 1

 

 

11:20 – 11:40

Directed Self-Assembly of Block Copolymers via Photothermal Affect

 

Hyeong Min Jin, Kaist

 

11:40 – 12:00

Entropy Dependence of Ordering Kinetic and Segregation Thermodynamic in 2D Hexagonal Pattern of Cylinder-Forming PS-b-PMMA Block Copolymer

 

Gabriele Seguini, Laboratorio MDM

 

12:00 – 12:20

 

Relaxing Anneal Requirements for Block Copolymer (BCP) Process Optimization

 

 

Mary Ann Hockey, Brewer Science

Lunch/ Poster session /Invited presentation

 

 

12:20 – 13:20

 

Lunch

 

 

13:20 – 14:40

 

Poster session

 

 

14:40 – 15:10

 

Invited paper:

Self-Assembled PS-b-PMMA Block Copolymers: A Valuable Platform for Application Driven Investigations

 

 

Michele Perego, Laboratorio MDM

Session 3: Simulation

 

 

15:10 – 15:30

 

Ising-Model-Based Computation by Using Block Copolymer Self-Assembly

 

Hyung Wan Do, MIT

 

15:30 – 15:50

 

Defect Reduction of Chemi-epitaxy DSA Pattern

 

Makoto Muramatsu, TEL

 

15:50 – 16:10

 

Analyzing the Mechanisms of Cylinder fFrmation and Defect Annihilation in Single-Hole Confinements using the Zero-Temperature String Method

 

Cody Bezik, U. Chicago

 

16:10 – 16:40

 

Break

 

 

Session 4: Processing 2

 

 

16:40 – 17:00

 

Implementation of Directed Self-Assembly of Block Copolymers in Manufacturing: Opportunities and Challenges

 

Paulina Rincon-Delgadillo, IMEC

 

17:00 – 17:20

 

Defect Dynamics in Self-Assembling Processes of Block Copolymers

 

Azuma Tsukasa, Eidic

     
     

 

19:00 – 22:30

 

Conference Dinner

 

 

Tuesday, September 19, 2017

 

 

9:00 – 9:35

 

Keynote presentation:

Directed Self Assembly Technology and Applications

 

Seiji Morita, Toshiba

 

Session 5: Materials

 

 

9:35 – 9:55

 

Design of Block Copolymers for Sub-10nm Lithography

 

Natsuko Ito, University of Texas

 

 9:55 – 10:15

 

Templated Self-assembly of PS-branch-PDMS Janus Bottle Brush Copolymer

 

Li-Chen Cheng, MIT

 

10:15 – 10:35

 

Materials Meeting Electronic Requirements for Sub-10 nm Lithograph

 

Christophe Navarro, Arkema

 

10:35 – 10:55

 

Metal Reduction on High X Block Copolymer by Filtration

 

Toru Umeda, Nihon Pall

 

10:55 – 11:20

 

Break

 

 

Session 6: Design 2

 

 

11:20 – 11:40

 

Inorganic Guiding Template Implementation for DSA Contact Hole Shrink Process

 

Ahmed Gharbi, CEA-Leti

 

11:40 – 12:00

 

Orientation Control of Block Copolymers for DSA Applications

 

Kristin Schmidt, IBM

 

12:00 – 12:20

 

Self-Asligned Cut Masks for Directed Self-Assembly of Device Relevant Features

 

 

Moshe Dolejsi, Univ of Chicago

Lunch/ Invited Presentation

 

 

12:20 – 13:20

 

Lunch

 

 

13:20 – 13:50

 

Invited presentation:

BCP self-assembly and DSA process characterization with 3D CDSEM

 

 

Shimon Levi, AMAT

Session 7: Metrology

 

 

13:50 – 14:10

 

DSA Metrology using molecular simulation and SAXS

 

Alec Bowen, Univ of Chicago

 

14:10 – 14:30

 

In situ investigation of Al2O3 growth via sequential infiltration synthesis in self-assembled block copolymer templates

 

 

Danielle Nazarri, Laboratorio MDM

 

 

14:30 – 14:50

 

Characterization of the Internal Structure of BCP Filled Contact Holes with Critical Dimension Small Angle X-ray Scattering

 

Daniel Sunday, NIST

 

14:50 – 15:20

 

3D Metrology for Graphoepitaxy DSA Hole Shrink Process

 

Chun Zhou, University of Chicago

     
     

Discussion, Voting and adjourn

 

 

15:20 – 16:20

 

Debate and Voting

 

all

 

16:20 – 16:40

 

Closing Remarks

 

 

 

   

 

 


 

Poster session

 

 

P01

 

CD-SEM Metrology investigation for DSA high-resolution line and space patterning

 

 

Ahmed Gharbi, CEA-Leti.

P02

Directed Self-Assembly by chemo-epitaxy approach for sub-10nm line/space patterning

 

Maxime Argoud, CEA-Leti

P03

Effect of Block Copolymer structural asymmetry on directed self-assembly from simulation

 

Benjamin Nation, Georgia Institute of Technology

P04

Xylan Block Copolymer for Wide-Range Directed Self-Assembly Lithography and Sequential Infiltration Synthesis

 

Kazuyo Morita, Oji Holdings Corporation

P05

Influence of Casting-solvent on the self-assembly of sub-10nm PS-b-PDMS

 

Tommaso J. Giammaria, Laboratorio MDM

P06

Synthesis and self-assembly of poly(4-tertbutylstyrene)-block-poly(2-hydroxyethyl methacrylate)

 

Caleb Breaux, Georgia Institute of Technology

P07

Effect of Film Thickness and Mixed Solvent Vapor Ratio on Thin-Film Morphologies of ABA Triblock Copolymers under Solvent Vapor Annealing

 

Sangho Lee, MIT

P08

3D Complicated Multimetal Nanomesh Patterns Fabricated from Perforacted Lamellar Block Copolymer Self-Assembly

 

Seung Keun Cha, KAIST

P09

Low defect density hexagonal array patterning with the CHIPS flow

 

Arjun Singh, IMEC

P10

Process optimization and variability improvement of contact holes using grapho-epitaxy DSA

 

Caroline Boeckx, IMEC

P11

Tuning Localized Surface Plasmon Resonances by self-assembly in Multi-Metal Nanostructures

 

Hanna Hulkonen, Tampere University of Technology

P12

Effect of Xylan on Block Copolymer for Directed Self-Assembly Lithography  

 

Kazuyo Morita, Oji Holdings Corporation

P13

Formation of 3D DSA Structure Using Liquid Crystalline Block Copolymer Linked by Metal Complex

 

Miki Fukuya, Sumitumo Bakelite Corporation

P14

Efficient Modeling of DSA using advanced computation methods

 

Benjamin Nation, Georgia Institute of Technology

P15

DSA Process Window Expansion by Oxygen Concentration

 

Yuji Tanak, Screen

P16

Phase Separation Performance of topcoat free Si-containing High X Block Copolymers

 

Yukio Kawaguchi, HORIBA STEC

P17

Directed Self Assembly of liquid crystalline blue-phases into ideal single crystals

 

Xiao Li, University of Chicago

P18

Structural Interrogation of thin polymer films using soft X-rays

 

Daniel Sunday, NIST

P19

Directed Self-Assembly of Colloidal particles onto nematic liquid crystalline defects engineered by chemically patterned surfaces

 

Xiao Li, University of Chicago