Poster session

 

 

P01

 

CD-SEM Metrology investigation for DSA high-resolution line and space patterning

 

 

Ahmed Gharbi, CEA-Leti.

P02

Directed Self-Assembly by chemo-epitaxy approach for sub-10nm line/space patterning

 

Maxime Argoud, CEA-Leti

P03

Effect of Block Copolymer structural asymmetry on directed self-assembly from simulation

 

Benjamin Nation, Georgia Institute of Technology

P04

Xylan Block Copolymer for Wide-Range Directed Self-Assembly Lithography and Sequential Infiltration Synthesis

 

Kazuyo Morita, Oji Holdings Corporation

P05

Influence of Casting-solvent on the self-assembly of sub-10nm PS-b-PDMS

 

Tommaso J. Giammaria, Laboratorio MDM

P06

Synthesis and self-assembly of poly(4-tertbutylstyrene)-block-poly(2-hydroxyethyl methacrylate)

 

Caleb Breaux, Georgia Institute of Technology

P07

Effect of Film Thickness and Mixed Solvent Vapor Ratio on Thin-Film Morphologies of ABA Triblock Copolymers under Solvent Vapor Annealing

 

Sangho Lee, MIT

P08

3D Complicated Multimetal Nanomesh Patterns Fabricated from Perforacted Lamellar Block Copolymer Self-Assembly

 

Seung Keun Cha, KAIST

P09

Low defect density hexagonal array patterning with the CHIPS flow

 

Arjun Singh, IMEC

P10

Process optimization and variability improvement of contact holes using grapho-epitaxy DSA

 

Caroline Boeckx, IMEC

P11

Tuning Localized Surface Plasmon Resonances by self-assembly in Multi-Metal Nanostructures

 

Hanna Hulkonen, Tampere University of Technology

P12

Effect of Xylan on Block Copolymer for Directed Self-Assembly Lithography  

 

Kazuyo Morita, Oji Holdings Corporation

P13

Formation of 3D DSA Structure Using Liquid Crystalline Block Copolymer Linked by Metal Complex

 

Miki Fukuya, Sumitumo Bakelite Corporation

P14

Efficient Modeling of DSA using advanced computation methods

 

Benjamin Nation, Georgia Institute of Technology

P15

DSA Process Window Expansion by Oxygen Concentration

 

Yuji Tanak, Screen

P16

Phase Separation Performance of topcoat free Si-containing High X Block Copolymers

 

Yukio Kawaguchi, HORIBA STEC

P17

Directed Self Assembly of liquid crystalline blue-phases into ideal single crystals

 

Xiao Li, University of Chicago

P18

Structural Interrogation of thin polymer films using soft X-rays

 

Daniel Sunday, NIST

P19

Directed Self-Assembly of Colloidal particles onto nematic liquid crystalline defects engineered by chemically patterned surfaces

 

Xiao Li, University of Chicago