Poster session

 

 

P01

 

Formation of Alternative Lamellar Structure with sub-10nm Domain Spacing using Multiblock Copolymers

 

 

Atsushi Takano, Nagoya Univ.

P02

Fabrication of horizontal well-ordered MoS2 nanowire arrays on substrate via self-assembly of BCP: Electrical studies

 

Colm Keating, CRANN, Trinity College Dublin

P03

Laser Directed Self-Assembly of Block Copolymers

 

Hyeong Min Jin, KAIST

P04

Atomistic Simulations of Oligomers used in Directed Self-Assembly Lithography: Estimation of the Interaction Parameter χ

 

Panagiotis-Nikolaos Tzounis, Univ. of Athenes

P05

Single Unperturbed Chain Monte Carlo Algorithm: A General Methodology for Estimating the Dimensions of Polymer Chains

 

Panagiotis-Nikolaos Tzounis, Univ. of Athenes

P06

Development of Perpendicularly Oriented Block Copolymer Lamellar Structures Without Surface Modification

 

Se Jin Ku, LG Chem Corporate R&D

P07

Considerations in Compact Modeling for Phase Transition Prediction of Cylinder Forming Grapho-Epitaxial Processes

 

Polina Krasnova, Mentor Graphics

P08

Mass production of block copolymers for next generation nanolithographic application

 

Yukio Kawaguchi, Horiba

P09

DSA Process Window Expansion with Novel DSA Track Hardware

 

Yuji Tanaka, Screen

P10

Influence of polymer properties on pattern characteristics of PS-b-PMMA films

 

Barbara Kosmala, Univ. College Cork

P11

Hierarchical Directed Self-Assembly of PS-b-PMMA

for Modified Pattern Symmetries

 

Young Joo Choi, KAIST

P12

Modeling Block Copolymer 3D Structures via Multiple Characterization Methods    

 

T. W. Collins, Univ. College Cork

P13

Modelling approaches for block copolymer based contact hole shrink applications

 

Ulrich Welling, Univ. of Göttingen

P14

Toward Diblock Copolymer Based Metrological Standards

 

Federico Ferrarese Lupi, INRM

P15

Molecular Weight Dependence of Lateral ordering growth rate in asymmetric PS-b-PMMA thin films

 

Gabriele Seguini, IMM-CNR

P16

Selective mat modification using wet treatment methods for TRAC flow

 

Varun Vaid, imec

P17

Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Structures for Antireflective Surfaces

 

Parvaneh Mokarian-Tabari, CRANN, Trinity College

P18

Ultrarapid Plasma Treatment to favor Directed Self-Assembly in PS-b-PEO

 

E.Giraud, Univ. College Cork

P19

3D modeling of the DSA planarization approach

 

Przemysław Michalak, Fraunhofer IISB

P20

Simulation of defect formation in DSA process

 

B. Meliorisz, Synopsys GmbH

 

 

 

P22

Process Parameter Induced Roughness for High χ BCPs

 

Mary Ann Hockey, Brewer

P23

Templated DSA vias in sub-7 nm circuits: Design strategy and DSA-aware via decomposition

 

Ioannis Karageorgos, imec

P24

Brush and BCPmaterial development for  DSA hole shrink process

 

Hitoshi Yamano, TOK

P25

Advanced process control of new block copolymer systems to achieve high volume manufacturing specifications

 

S. Martinez, Pollen

P26

GISAXS study of contact hole shrink process based on

graphoepitaxy of cylindrical morphology PS-b-PMMA block copolymers

 

G. Freychet, Leti

P27

Substrate Compatible Neutral-layers for Successful DSA Applications

 

Victor Monreal, EMD

P28

DSA Materials In-film Defectivity Advanced Investigation

 

Maxime Argoud, Leti

P29

Etch transfer characteristics of sub−25 nm half pitch graphoepitaxial DSA contact holes

Nick Brakensiek, Brewer Science