Sunday, September 17, 2017

17:00 – 19:30

Opening reception and poster session

Monday, September 18, 2017

9:00 – 9:15

Opening remarks

9:15 – 9:50

Keynote Presentation:

DSA patterning options for logic and memory applications

Charlie Liu, IBM

Session 1: Design 1

9:50 – 10:10

Silicon Nanowires Patterning using UV-assisted Graphoepitaxy Approach for Precise Control of Template Affinity

Maxime Argoud, CEA-Leti

10:10 – 10:30

Directed Self-Assembly of Block Copolymer Films on Atomically-Thin Graphene Chemical Patterns

Shisheng Xiong, U. Chicago

10:30 - 10:50

Directed Self-Assembly integration Scheme for the Fabriaction of Suspended Nanowires

Marta Fernandez-Regulez, IMB-CNM

10:50 – 11:20

Break

Session 2: Processing 1

11:20 – 11:40

Directed Self-Assembly of Block Copolymers via Photothermal Affect

Hyeong Min Jin, Kaist

11:40 – 12:00

Entropy Dependence of Ordering Kinetic and Segregation Thermodynamic in 2D Hexagonal Pattern of Cylinder-Forming PS-b-PMMA Block Copolymer

Gabriele Seguini, Laboratorio MDM

12:00 – 12:20

Relaxing Anneal Requirements for Block Copolymer (BCP) Process Optimization

Mary Ann Hockey, Brewer Science

Lunch/ Poster session /Invited presentation

12:20 – 13:20

Lunch

13:20 – 14:40

Poster session

14:40 – 15:10

Invited paper:

Self-Assembled PS-b-PMMA Block Copolymers: A Valuable Platform for Application Driven Investigations

Michele Perego, Laboratorio MDM

Session 3: Simulation

15:10 – 15:30

Ising-Model-Based Computation by Using Block Copolymer Self-Assembly

Hyung Wan Do, MIT

15:30 – 15:50

Defect Reduction of Chemi-epitaxy DSA Pattern

Makoto Muramatsu, TEL

15:50 – 16:10

Analyzing the Mechanisms of Cylinder fFrmation and Defect Annihilation in Single-Hole Confinements using the Zero-Temperature String Method

Cody Bezik, U. Chicago

16:10 – 16:40

Break

Session 4: Processing 2

16:40 – 17:00

Implementation of Directed Self-Assembly of Block Copolymers in Manufacturing: Opportunities and Challenges

Paulina Rincon-Delgadillo, IMEC

17:00 – 17:20

Defect Dynamics in Self-Assembling Processes of Block Copolymers

Azuma Tsukasa, Eidic

19:00 – 22:30

Conference Dinner

Tuesday, September 19, 2017

9:00 – 9:35

Keynote presentation:

Directed Self Assembly Technology and Applications

Seiji Morita, Toshiba

Session 5: Materials

9:35 – 9:55

Design of Block Copolymers for Sub-10nm Lithography

Natsuko Ito, University of Texas

 9:55 – 10:15

Templated Self-assembly of PS-branch-PDMS Janus Bottle Brush Copolymer

Li-Chen Cheng, MIT

10:15 – 10:35

Materials Meeting Electronic Requirements for Sub-10 nm Lithograph

Christophe Navarro, Arkema

10:35 – 10:55

Metal Reduction on High X Block Copolymer by Filtration

Toru Umeda, Nihon Pall

10:55 – 11:20

Break

Session 6: Design 2

11:20 – 11:40

Inorganic Guiding Template Implementation for DSA Contact Hole Shrink Process

Ahmed Gharbi, CEA-Leti

11:40 – 12:00

Orientation Control of Block Copolymers for DSA Applications

Kristin Schmidt, IBM

12:00 – 12:20

Self-Asligned Cut Masks for Directed Self-Assembly of Device Relevant Features

Moshe Dolejsi, Univ of Chicago

Lunch/ Invited Presentation

12:20 – 13:20

Lunch

13:20 – 13:50

Invited presentation:

BCP self-assembly and DSA process characterization with 3D CDSEM

Shimon Levi, AMAT

Session 7: Metrology

13:50 – 14:10

DSA Metrology using molecular simulation and SAXS

Alec Bowen, Univ of Chicago

14:10 – 14:30

In situ investigation of Al2O3 growth via sequential infiltration synthesis in self-assembled block copolymer templates

Danielle Nazarri, Laboratorio MDM

14:30 – 14:50

Daniel Sunday, NIST

14:50 – 15:20

3D Metrology for Graphoepitaxy DSA Hole Shrink Process

Chun Zhou, University of Chicago

Discussion, Voting and adjourn

15:20 – 16:20

Debate and Voting

all

16:20 – 16:40

Closing Remarks