Agenda | |||
Sunday, September 17, 2017
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17:00 – 19:30
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Opening reception and poster session
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Monday, September 18, 2017
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9:00 – 9:15 |
Opening remarks |
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9:15 – 9:50 |
Keynote Presentation: DSA patterning options for logic and memory applications
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Charlie Liu, IBM |
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Session 1: Design 1
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9:50 – 10:10 |
Silicon Nanowires Patterning using UV-assisted Graphoepitaxy Approach for Precise Control of Template Affinity |
Maxime Argoud, CEA-Leti |
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10:10 – 10:30 |
Directed Self-Assembly of Block Copolymer Films on Atomically-Thin Graphene Chemical Patterns |
Shisheng Xiong, U. Chicago |
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10:30 - 10:50 |
Directed Self-Assembly integration Scheme for the Fabriaction of Suspended Nanowires |
Marta Fernandez-Regulez, IMB-CNM |
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10:50 – 11:20 |
Break
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Session 2: Processing 1
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11:20 – 11:40 |
Directed Self-Assembly of Block Copolymers via Photothermal Affect |
Hyeong Min Jin, Kaist |
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11:40 – 12:00 |
Entropy Dependence of Ordering Kinetic and Segregation Thermodynamic in 2D Hexagonal Pattern of Cylinder-Forming PS-b-PMMA Block Copolymer |
Gabriele Seguini, Laboratorio MDM |
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12:00 – 12:20 |
Relaxing Anneal Requirements for Block Copolymer (BCP) Process Optimization
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Mary Ann Hockey, Brewer Science |
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Lunch/ Poster session /Invited presentation
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12:20 – 13:20 |
Lunch |
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13:20 – 14:40 |
Poster session |
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14:40 – 15:10 |
Invited paper: Self-Assembled PS-b-PMMA Block Copolymers: A Valuable Platform for Application Driven Investigations
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Michele Perego, Laboratorio MDM |
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Session 3: Simulation
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15:10 – 15:30 |
Ising-Model-Based Computation by Using Block Copolymer Self-Assembly |
Hyung Wan Do, MIT |
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15:30 – 15:50 |
Defect Reduction of Chemi-epitaxy DSA Pattern |
Makoto Muramatsu, TEL |
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15:50 – 16:10 |
Analyzing the Mechanisms of Cylinder fFrmation and Defect Annihilation in Single-Hole Confinements using the Zero-Temperature String Method |
Cody Bezik, U. Chicago |
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16:10 – 16:40 |
Break
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Session 4: Processing 2
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16:40 – 17:00 |
Implementation of Directed Self-Assembly of Block Copolymers in Manufacturing: Opportunities and Challenges |
Paulina Rincon-Delgadillo, IMEC |
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17:00 – 17:20 |
Defect Dynamics in Self-Assembling Processes of Block Copolymers |
Azuma Tsukasa, Eidic |
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19:00 – 22:30 |
Conference Dinner
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Tuesday, September 19, 2017
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9:00 – 9:35 |
Keynote presentation: Directed Self Assembly Technology and Applications |
Seiji Morita, Toshiba
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Session 5: Materials
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9:35 – 9:55 |
Design of Block Copolymers for Sub-10nm Lithography |
Natsuko Ito, University of Texas |
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9:55 – 10:15 |
Templated Self-assembly of PS-branch-PDMS Janus Bottle Brush Copolymer |
Li-Chen Cheng, MIT |
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10:15 – 10:35 |
Materials Meeting Electronic Requirements for Sub-10 nm Lithograph |
Christophe Navarro, Arkema |
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10:35 – 10:55 |
Metal Reduction on High X Block Copolymer by Filtration |
Toru Umeda, Nihon Pall |
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10:55 – 11:20 |
Break
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Session 6: Design 2
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11:20 – 11:40 |
Inorganic Guiding Template Implementation for DSA Contact Hole Shrink Process |
Ahmed Gharbi, CEA-Leti |
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11:40 – 12:00 |
Orientation Control of Block Copolymers for DSA Applications |
Kristin Schmidt, IBM |
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12:00 – 12:20 |
Self-Asligned Cut Masks for Directed Self-Assembly of Device Relevant Features
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Moshe Dolejsi, Univ of Chicago |
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Lunch/ Invited Presentation
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12:20 – 13:20 |
Lunch |
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13:20 – 13:50 |
Invited presentation: BCP self-assembly and DSA process characterization with 3D CDSEM
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Shimon Levi, AMAT |
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Session 7: Metrology
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13:50 – 14:10 |
DSA Metrology using molecular simulation and SAXS |
Alec Bowen, Univ of Chicago |
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14:10 – 14:30 |
In situ investigation of Al2O3 growth via sequential infiltration synthesis in self-assembled block copolymer templates
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Danielle Nazarri, Laboratorio MDM |
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14:30 – 14:50 |
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Daniel Sunday, NIST |
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14:50 – 15:20 |
3D Metrology for Graphoepitaxy DSA Hole Shrink Process |
Chun Zhou, University of Chicago |
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Discussion, Voting and adjourn
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15:20 – 16:20 |
Debate and Voting |
all |
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16:20 – 16:40 |
Closing Remarks |
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