Agenda

Sunday, September 17, 2017

 

17:00 – 19:30

Opening reception and poster session

Monday, September 18, 2017

 

9:00 – 9:15

Opening remarks

 

9:15 – 9:50

Keynote Presentation:

DSA patterning options for logic and memory applications

Charlie Liu, IBM

Session 1: Design 1

 

 

9:50 – 10:10

 

Silicon Nanowires Patterning using UV-assisted Graphoepitaxy Approach for Precise Control of Template Affinity

 

Maxime Argoud, CEA-Leti

 

10:10 – 10:30

 

Directed Self-Assembly of Block Copolymer Films on Atomically-Thin Graphene Chemical Patterns

 

Shisheng Xiong, U. Chicago

 

10:30 - 10:50

 

Directed Self-Assembly integration Scheme for the Fabriaction of Suspended Nanowires

 

Marta Fernandez-Regulez, IMB-CNM

 

10:50 – 11:20

 

Break

 

 

Session 2: Processing 1

 

 

11:20 – 11:40

Directed Self-Assembly of Block Copolymers via Photothermal Affect

 

Hyeong Min Jin, Kaist

 

11:40 – 12:00

Entropy Dependence of Ordering Kinetic and Segregation Thermodynamic in 2D Hexagonal Pattern of Cylinder-Forming PS-b-PMMA Block Copolymer

 

Gabriele Seguini, Laboratorio MDM

 

12:00 – 12:20

 

Relaxing Anneal Requirements for Block Copolymer (BCP) Process Optimization

 

 

Mary Ann Hockey, Brewer Science

Lunch/ Poster session /Invited presentation

 

 

12:20 – 13:20

 

Lunch

 

 

13:20 – 14:40

 

Poster session

 

 

14:40 – 15:10

 

Invited paper:

Self-Assembled PS-b-PMMA Block Copolymers: A Valuable Platform for Application Driven Investigations

 

 

Michele Perego, Laboratorio MDM

Session 3: Simulation

 

 

15:10 – 15:30

 

Ising-Model-Based Computation by Using Block Copolymer Self-Assembly

 

Hyung Wan Do, MIT

 

15:30 – 15:50

 

Defect Reduction of Chemi-epitaxy DSA Pattern

 

Makoto Muramatsu, TEL

 

15:50 – 16:10

 

Analyzing the Mechanisms of Cylinder fFrmation and Defect Annihilation in Single-Hole Confinements using the Zero-Temperature String Method

 

Cody Bezik, U. Chicago

 

16:10 – 16:40

 

Break

 

 

Session 4: Processing 2

 

 

16:40 – 17:00

 

Implementation of Directed Self-Assembly of Block Copolymers in Manufacturing: Opportunities and Challenges

 

Paulina Rincon-Delgadillo, IMEC

 

17:00 – 17:20

 

Defect Dynamics in Self-Assembling Processes of Block Copolymers

 

Azuma Tsukasa, Eidic

     
     

 

19:00 – 22:30

 

Conference Dinner

 

 

Tuesday, September 19, 2017

 

 

9:00 – 9:35

 

Keynote presentation:

Directed Self Assembly Technology and Applications

 

Seiji Morita, Toshiba

 

Session 5: Materials

 

 

9:35 – 9:55

 

Design of Block Copolymers for Sub-10nm Lithography

 

Natsuko Ito, University of Texas

 

 9:55 – 10:15

 

Templated Self-assembly of PS-branch-PDMS Janus Bottle Brush Copolymer

 

Li-Chen Cheng, MIT

 

10:15 – 10:35

 

Materials Meeting Electronic Requirements for Sub-10 nm Lithograph

 

Christophe Navarro, Arkema

 

10:35 – 10:55

 

Metal Reduction on High X Block Copolymer by Filtration

 

Toru Umeda, Nihon Pall

 

10:55 – 11:20

 

Break

 

 

Session 6: Design 2

 

 

11:20 – 11:40

 

Inorganic Guiding Template Implementation for DSA Contact Hole Shrink Process

 

Ahmed Gharbi, CEA-Leti

 

11:40 – 12:00

 

Orientation Control of Block Copolymers for DSA Applications

 

Kristin Schmidt, IBM

 

12:00 – 12:20

 

Self-Asligned Cut Masks for Directed Self-Assembly of Device Relevant Features

 

 

Moshe Dolejsi, Univ of Chicago

Lunch/ Invited Presentation

 

 

12:20 – 13:20

 

Lunch

 

 

13:20 – 13:50

 

Invited presentation:

BCP self-assembly and DSA process characterization with 3D CDSEM

 

 

Shimon Levi, AMAT

Session 7: Metrology

 

 

13:50 – 14:10

 

DSA Metrology using molecular simulation and SAXS

 

Alec Bowen, Univ of Chicago

 

14:10 – 14:30

 

In situ investigation of Al2O3 growth via sequential infiltration synthesis in self-assembled block copolymer templates

 

 

Danielle Nazarri, Laboratorio MDM

 

 

14:30 – 14:50

 

Characterization of the Internal Structure of BCP Filled Contact Holes with Critical Dimension Small Angle X-ray Scattering

 

Daniel Sunday, NIST

 

14:50 – 15:20

 

3D Metrology for Graphoepitaxy DSA Hole Shrink Process

 

Chun Zhou, University of Chicago

     
     

Discussion, Voting and adjourn

 

 

15:20 – 16:20

 

Debate and Voting

 

all

 

16:20 – 16:40

 

Closing Remarks