High Resolution Patterning with Organosilicon Block Copolymers: A Progress Report 

 

Grant Willson profile picture

Prof. Grant Willson received his BS and Ph.D. in Organic Chemistry from the University of California at Berkeley and an MS degree in Organic Chemistry from San Diego State University.  He joined the faculties of the Departments of Chemical Engineering and Chemistry at the University of Texas at Austin in 1993. He came to the University of Texas from his position as an IBM Fellow and Manager of the Polymer Science and Technology area at the IBM Almaden Research Center in San Jose, California. He joined IBM after serving on the faculties of California State University, Long Beach and the University of California, San Diego.   He has supervised the PhD degrees of more than 80 graduate students. His research can be characterized as the design and synthesis of functional organic materials with emphasis on materials for microelectronics. These include liquid crystalline materials, polymeric non-linear optical materials, novel photoresist materials, block copolymers, materials for Imprint Lithography, etc. This work is supported by grants from both government and industry.

  He is a Fellow of IBM, the ACS, SPIE, PMSE and the MRS.  He is a member of the National Academy of Engineering and Associate Editor of ACS Nano. He is the co-author of more than 300 journal publications, editor and author of several books and co-inventor on more than 40 issued patents.  His work has been recognized by a number of awards including the National Medal of Technology and Innovation which was presented by President Bush and the 2013 Japan Prize, which he shared with Professor Jean Fréchet. 
 

 

 

 

 

Block polymers for DSA applications based on A-(B-random-C) architectures

 

Paul F. Nealey

Prof. Paul Nealey is a pioneer of directed self-assembly, which is becoming very important in microelectronics processing to create patterns for integrated circuits. He is one of the world’s leading experts on patterning organic materials, literally creating physical patterns of structure and composition in the materials at the nanometer length scale, where the patterns affect the function of the materials.

Many of Nealey’s collaborative projects with Juan de Pablo have focused on block copolymer films, which spontaneously self-assemble to form structures with dimensions that range from three to 50 nanometers. Nealey’s experimental and de Pablo’s computational teamwork extends even to jointly advised doctoral students. Their approach has become so powerfully productive that other institutions seek to replicate their formula for success with their own research teams.

Nealey’s interest in tissue engineering of corneal prosthetic devices, pursued in collaboration with a veterinary ophthalmologist, demonstrates the versatility of his expertise in fabricating nanostructured surfaces.

  Nealey holds 14 patents and is the author of more than 180 publications. His honors include fellowship in the American Physical Society, the 2010 Nanoscale Science and Engineering Forum Award from the American Institute of Chemical Engineers, and a 2009 Inventor Recognition Award from Semiconductor Research Corporation.