The DSA symposium will take place in the CNR congress center in Milan. The congress center can be easily reached using public transportation or by car. More information on how to get to the CNR congress center are avalable here. Oral communications will take place in the main room of the congress center. Poster sessions, coffee breaks and welcome party will be organized in the adjacent rooms. More information will come about the social dinner.
| Wednesday, October 16, 2019 | |
| 17:30 | Welcome party |
| Thursday, October 17, 2019 | |
| 09:00 | Introduction |
| Session I: Advanced Materials | |
| 09:10 | "High Resolution Patterning with Organosilicon Block Copolymers: A Progress Report", Prof. Grant Willson, University of Texas (Keynote) |
| 09:50 | "Side-Chain and Chain-End Modifications of PS-b-PMMA to Create New High χ Block Copolymers", Takuya Isono, Hokkaido University |
| 10:10 | "Block Polymers for DSA (Directed Self Assembly) Using Micro Reactor Technology", Hisakazu Tanaka, DIC Corporation |
| 10:30 | Break |
| Session II: Morphology and Orientation | |
| 10:50 | "Overcoming the thermodynamic dilemma of sub-10 nm perpendicular domain self-assembly using gradient random block copolymers", Seung Won Song, KAIST |
| 11:10 | "Universal perpendicular orientation of block copolymer microdomains for DSA applications", Jeong Gon Son, Korea Institute of Science and Technology |
| 11:30 | "Controlling Feature Size and Morphology of Microphase-Separated Structures via Intramolecular Crosslinking of Block Copolymers", Koadi Watanabe, Hokkaido University |
| 11:50 | "Phase Transition Between Gyroid and Cylindrical Morphology in Linear Triblock Terpolymer Thin Films", Christophe Sinturel, University of Orléans |
| 12:10 | Lunch |
| 13:10 | Poster Session |
| Session III: Defects and Ordering - 1 | |
| 14:10 | "DSA pattern defect mitigation by process optimization", Makoto Muramatsu, Tokyo Electron Kyushu, Ltd. (Invited) |
| 14:50 | "Defect mitigation in sub-20 nm patterning with high-X, silicon containing block copolymers", Jan Doise, imec |
| 15:10 | "Shear-solvo defect annihilation of diblock copolymer thin films over a large area", So Youn Kim, Ulsan National Institute of Science and Technology |
| 15:30 | Break |
| Session IV: Defects and Ordering - 2 | |
| 15:50 | "Development of Ordered Structures and Defects in Sub-10 nm Perpendicular Lamellar Thin Films", Alvin Chandra, Tokyo Institute of Technology |
| 16:10 | "Hexagonal pattern coarsening in cylinder-forming PS-b-PMMA block copolymer thin films", Gabriele Seguini, CNR-IMM |
| 16:30 | "Enhanced Lateral Ordering in Lamellar BCP/Homopolymer Blends", Irdi Murataj, INRIM |
| 16:50 | "Film Thickness and Temperature Effects in Block Copolymer Thin Films Explored by Autonomous Combinatorial Experiment", Pawel Majewski, University of Warsaw |
| 20:00 | Social Dinner |
| Friday, October 18, 2019 | |
| Session V: Advanced DSA Strategies | |
| 09:00 | "Block polymers for DSA applications based on A-(B-random-C) architectures", Prof. Paul Nealey, Universtiy of Chicago (Keynote) |
| 09:40 | "Block copolymer directed self-assembly in sub-10nm topographical guiding patterns", Marta Fernandez-Regulez, IMB-CNM, CSIC |
| 10:10 | "Directed Self-Assembly of Block Copolymers on Chemically Modified Graphene", Sang Ouk Kim, KAIST |
| 10:30 | Break |
| Session VI: Advanced DSA Strategies | |
| 10:50 | "High Volume Manufacturing Readiness of DSA Process", Dr. Hyo Seon Suh, imec (Invited) |
| 11:30 | "Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography", Guido Rademaker, CEA LETI |
| 11:50 | "Computer Simulations in DSA Problem Solving", Su-Mi Hur, Chonnam National University |
| 12:10 | Lunch |
| 13:00 | Poster Session |
| Session VII: Ordering and Roughness | |
| 14:00 | "Hierarchical nanostructures by controlled block copolymer film thickness modulation on pre-patterned surfaces", Katharina Brassat, Paderborn University |
| 14:20 | "Hierarchically Ordered Dewetted BCP Films on Chemically Patterned Surfaces", Federico Ferrarese Lupi, INRIM |
| 14:40 | "Block copolymer roughness measurement via PSD : application to fingerprint and Directed Self-Assembly", Aurélie Le Pennec, CEA LETI |
| 15:00 | "Roughness study on L/S patterning with chemo-epitaxy DSA", Viktor Dudash, imec |
| 15:20 | Break |
| Session VIII: Inorganic Nanostructure Formation | |
| 15:40 | "Block-copolymer based optically resonant nanostructured surfaces", Virginie Ponsinet, CNRS-CRPP |
| 16:00 | "Si nano-pillars obtained by sequential infiltration synthesis in directed self-assembled block copolymers", Michele Perego, CNR-IMM |
| 16:20 | "Expanding the Materials Library in Sequential Infiltration Synthesis: Conductive Indium and Gallium Oxides", Ruben Waldman, University of Chicago |
| 16:40 | Closing Remarks |
| Poster Session | |
| P1 | "Optimizing polymer brush coverage to develop highly coherent oxide films by ion inclusion", Ross Lundy, Trinity College Dublin |
| P2 | "Correlation between morphology and coordination of nanopores created by block copolymer lithography", Katharina Brassat, Paderborn University |
| P3 | "Mass Production Polymerization of Ultra-high Molecular Weight PS-b-PMMA Block Copolymer", Yukio Kawaguchi, HORIBA STEC,Co.,Ltd. |
| P4 | "Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose", Anette Löfstrand, NanoLund and Solid State Physics, Lund University |
| P5 | "Effect of trapped solvent on interphase between PS-b-PMMA thin film and P(S-r-MMA) brush layer", Riccardo Chiarcos, Università del Piemonte Orientale |
| P6 | "Grain-Boundary-Induced Alignment of Block Copolymer Thin Films ", Francesc Perez-Murano, IMB-CNM, CSIC |
| P7 | "In situ characterization of block copolymer self-assembly kinetics", Marta Fernandez-Regulez, IMB-CNM, CSIC |
| P8 | "Cross-characterization analysis of DSA chemo-epitaxial ACE process", Tommaso J. Giammaria, CEA LETI |
| P9 | "Quantitative analysis of the sequential infiltration synthesis in block copolymers films by reference-free grazing incidence X-ray fluorescence", Eleonora Cara, INRIM |
| P10 | "Expanding DSA process window with atmospheric control", Nathalie Frolet, SCREEN Semiconductor Solutions Co |