The 5th DSA Symposium will be held in Milan, Italy, October 16-18, 2019.



Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for Advanced Lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application. In an effort to identify and help resolve these remaining issues, a 5th International Symposium on DSA will be organized as a collaborative effort between CNR, imec, CEA-Leti,  and NIST, as a follow-up to the 4th edition hosted in Sapporo in 2018. DSA2019 will be held in Milan, Italy on Oct. 16-18, 2019. The conference venue will be the CNR conference center in Milan. The format will be similar to previous editions with an opening reception on October 16, and 2 full days of talks and a poster session on October 17-18



  • We are happy to announce that the DSA 2019 Conference handouts and the collection of submitted abstracts are available for download at the following link: DSA-2019.
  • The social dinner will take place at Museo Diocesano - Chiostri di Sant'Eustorgio in Milan City center. For more information about the location and hot to get there please refer to the information available on the page related to conference venue.
  • On line registration is now closed. You can register on site during the conference at the reception desk. The reception desk will open on October 16, 2019, from 16:30. 
  • The final program of the meeting has been defined. Please note that oral communications will take place in the main room of the CNR congress center. Poster sessions, coffee breaks and welcome party will be organized in the adjacent rooms. More information will come about the social dinner.
  • Online registration system is now open. To proceed with online registration please clik on the following link and fill the formavailable at Online registration. Registration is mandatory. All participants (including chairpersons, authors, presenting authors, invited speakers, scientific committee members…) must register. Online registration would be preferred, we highly recommend to issue your payment online as well, in order to avoid waiting during onsite registration. Registration fees include participation to coffe breaks, lunches and social dinner. Please note that  abstract submission and conference registration are separate items and are not linked. More information about registration  and conference fees are available on the web site in the registration page.






Satellite event:

The DSA symposium will be anticipated by the 1st  Workshop on Sequential infiltration synthesis - SIS 2019. The workshop will be held in Milan on October 16. The workshop venue will be the CNR conference center in Milan. The aim of this one-day workshop is to gather leading scientists and engineers from both academia and industry working on or interested in SIS to give an overview of current topics in the field. SIS 2019 will focus on the challenges related to potential applications of SIS as well as on the fundamental mechanisms. It will offer an event dedicated to present, discuss, exchange knowledge, and getting informed about the most recent developments, providing an opportunity for meeting, exchanging ideas, and designing new paths for collaborative research.



Student Fellowships:

We are very pleased to announce that AIM, the Italian Association for Macromolecules, will sponsor the conference supporting Italian students attending the symposium with fellowships covering the conference fees. More information  about the fellowships and the procedure to apply are available at the following link:  

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Best Poster Award:

We are very pleased to announce that Wiley sponsors an award for the best poster presented at the conference. A jury evaluates the quality of the posters using mainly the following three criteria: clarity, self-explanatory, and layout. The award winners will be announced during the closing ceremony of the conference.  





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