The 5th DSA Symposium will be held in Milan, Italy, October 16-18, 2019.



Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for Advanced Lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application. In an effort to identify and help resolve these remaining issues, a 5th International Symposium on DSA will be organized as a collaborative effort between CNR, imec, CEA-Leti,  and NIST, as a follow-up to the 4th edition hosted in Sapporo in 2018. DSA2019 will be held at Milan, Italy on Oct. 14-18, 2019. The conference venue will be the CNR conference center in Milan.  The format will be similar to previous editions with an opening reception, poster session and 2 full days of talks.